Differential Sputter Yields Of Boron Nitride, Quartz, and Kapton Due to Low Energy Xe Bombardment
نویسنده
چکیده
In this contribution we present results of differential sputter yield measurements of boron nitride, quartz, and kapton due to bombardment by xenon ions. The measurements are made using a sputtering diagnostic based on a quartz crystal microbalance (QCM). The QCM measurement allows full angular resolution, i.e. differential sputtering yield measurements are measured as a function of both polar angle and azimuthal angle. Measured profiles are presented for 100, 250, 350 and 500 eV Xe + bombardment at 0o, 15o, 30o and 45o angles of incidence. We fit the measured profiles with Modified Zhang expressions using two free parameters: the total sputter yield, Y, and characteristic energy E*. Total yields are calculated from the differential profiles and are compared with published values and weight loss values where possible.
منابع مشابه
Total and Differential Sputter Yields of Boron Nitride Measured by Quartz Crystal Microbalance
We present differential sputter yield measurements of boron nitride due to bombardment by xenon ions. A four-grid ion optics system is used to achieve a collimated ion beam at low energy (<100 eV). A quartz crystal microbalance (QCM) is used to measure differential sputter yield profiles of condensable components from which total sputter yields can also be determined. We report total and differ...
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